100~300μJ Erbium-doped aniani laser
HANA HANA
Loʻihi nalu | 1535 nm | 1535 nm | 1535 nm |
Puke puʻupuʻu(Min./Typ.) | ≥100μJ | ≥200 μJ | ≥300 μJ |
Ka laula puʻupuʻu, ʻano.(FWHM) | 3 .5 ns | 3.5 ns | 3.5 ns |
Ka helu hou ʻana o ka naʻau | 1~20 Hz | 1~10 Hz | 1~20 Hz |
Paʻa puʻupuʻu | 10% | 10% | 10% |
Anawaena kiko | 0.2 mm | 0.2 mm | 0.2 mm |
ʻO ke kihi ʻokoʻa o ke kukui | 10 mrad | 10 mrad | 10 mrad |
ʻAno kiko | TEM00 | TEM00 | TEM00 |
Hana wela | -45 ℃~+65 ℃ | -45 ℃~+65 ℃ | -45 ℃~+65 ℃ |
Mahana mālama | -55 ℃~+85 ℃ | -55 ℃~+85 ℃ | -55 ℃~+85 ℃ |
Ka hopena | 1500 G, 0.5 ms | 1500 G, 0.5 ms | 1500 G, 0.5 ms |
Haʻalulu | 20~2000 Hz/20 G | 20~2000 Hz/20 G | 20~2000 Hz/20 G |
Ka lōʻihi o ke ola | >50 miliona mau pana | >50 miliona mau pana | >50 miliona mau pana |
Ana (mm) | 25x8x7 | 25x8x7 | 25x8x7 |
Kaumaha | 8 g | 8 g | 8g |
Voltage | 2 V | 2 V | 2 V |
ʻO kēia manawa | 6 A | 12 A | 12 A |
Pulse laula | ≥2 ms | ≥1.8 ms | ≥2.5 ms |
NA KAHAI MEKANIKAL (ma ka mm)